Keithley Instruments Inc. - Online Seminar Registration Forms

Overcoming Gate Oxide Scaling Challenges in Semi. Reliability Testing Available on demand

This technical seminar continues the discussion of reliability issues begun in the previous seminar, New Measurement Techniques for Improving Semi. Device Reliability. It addresses test issues associated with gate oxide scaling and how these issues drive the need for higher volumes of test data earlier in the technology development cycle.

In this seminar, you will learn and understand:

Issues and findings related to gate oxide scaling including:
- Soft breakdown
- Progressive breakdown
- Charge trapping
How the issues related to gate oxide scaling drive the need for high volumes of data earlier in the development process
How TDDB and NBTI testing create challenges for traditional stress-measure testing architectures
How switchless parallel test architectures address the new test challenges

This seminar is recommended for engineers, students, researchers, and scientists in areas such as device reliability, new materials development, device characterization, and modeling who wish to learn how to use electrical measurements to gain a better understanding of emerging issues related to device performance and reliability.

Title

First Name

Last Name

E-mail Address

Confirm E-mail

Phone Number

Area

Number

Ext

FAX Number:	Area	Number

Company Name

Department

Job Title

Address

Address 2

Mail Stop

City

Zip/Postal Code

State/Province

Country

Password(Optional)

To get easy access to Keithley's many technical resources, please create a password below. This will eliminate the need for you to repeatedly provide your contact information.

Password

Confirm Password

	Already have a password?

E-mail
Password
	Forgot password?
	Remember my email.

Sections